Intellectual Property India Publishes Patent Application for Dual Phase Release System Comprising Microneedle Patches, Methods For Preparation And Uses Thereof

MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202511014094 A) filed by Shipra Rastogi on February 19, 2025, for Dual Phase Release System Comprising Microneedle Patches, Methods For Preparation And Uses Thereof.

Inventor includes Shipra Rastogi.

The application for the patent was published on September 25, 2026, under issue no. 39/2026.

Abstract: The present disclosure relates to a dual phase release system comprising a microneedle patch including a base layer and a plurality of dissolvable microneedles extending from the base layer. The microneedles comprise a first bioactive component dispersed within a first biocompatible polymeric matrix configured to dissolve upon insertion into skin. The...