Intellectual Property India Publishes Patent Application for Drainage Structure For Continuous And Uniform Negative-Pressure Conduction On All Wound Profiles

MUMBAI, India, Oct. 26 -- Intellectual Property India has published a patent application (202617090258 A) filed by Cheng, Hu on July 24, 2026, for Drainage Structure For Continuous And Uniform Negative-Pressure Conduction On All Wound Profiles.

Inventor includes Cheng, Hu.

The application for the patent was published on October 23, 2026, under issue no. 43/2026.

Abstract: Disclosed is a drainage structure for continuous and uniform negative-pressure conduction on all wound profiles. The drainage structure is used in cooperation with a porous foam layer and configured for a negative pressure drainage operation, and comprises a structure body. The side of the structure body opposite to the porous foam layer is provided with a separator. Th...