MUMBAI, India, July 30 -- Intellectual Property India has published a patent application (202641088183 A) filed by Sathyabama Institute Of Science And Technology; P. Karthika; and G. Sukanya on July 20, 2026, for Deep Learning Based Invisible Hazardous Gas Dispersion Mapping And Leak Origin Detection System.
Inventors include P. Karthika; and G. Sukanya.
The application for the patent was published on July 24, 2026, under issue no. 30/2026.
Abstract: ABSTRACT DEEP LEARNING BASED INVISIBLE HAZARDOUS GAS DISPERSION MAPPING AND LEAK ORIGIN DETECTION SYSTEM The main design of the present invention discloses a Deep Learning-Based Invisible Hazardous Gas Dispersion Mapping and Leak Origin Detection System, which comprises a sensor acquisition ...