Intellectual Property India Publishes Patent Application for Contrastive Deep Learning For Defect Inspection

MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202647074043 A) filed by Asml Netherlands B. V. on June 15, 2026, for Contrastive Deep Learning For Defect Inspection.

Inventors include Botari, Tiago; Faatz, Daniel, Robert; Schoonbeek, Tim, Jeroen; and Pronk, Bart.

The application for the patent was published on June 26, 2026, under issue no. 26/2026.

Abstract: An improved system (300) and method for defect detection for a wafer inspection system are disclosed. An improved method comprises acquiring a first input (3001) and a second input (3003), generating a first feature vector (3211) for the first input (3001) and a second feature vector (3222) for the second input (3003) using a machine learni...