MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202617064669 A) filed by Nissan Chemical Corporation on May 22, 2026, for Composition For Forming Resist Underlayer Film, And Resist Underlayer Film.
Inventors include Shimizu Shou; and Tamura Mamoru.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: Provided are: a composition for forming a resist underlayer film, the composition being capable of improving sensitivity in an EB exposure method or an EUV exposure method in comparison with the prior art; and a resist underlayer film. The composition for forming a resist underlayer film contains a polymer (A) and a solvent (B). The resist underlayer film ...