MUMBAI, India, Nov. 6 -- Intellectual Property India has published a patent application (202641129862 A) filed by Nitte Deemed To Be University; Dr Raghavendra Bairy; and Anusha Dinakar Rao on October 30, 2026, for Composition And Method For An Annealed Nickel-Doped Tin Oxide Thin Film For Optical Limiting Applications.
Inventors include Dr Raghavendra; and Anusha Dinakar Rao.
The application for the patent was published on November 06, 2026, under issue no. 45/2026.
Abstract: Disclosed herein is an annealed nickel-doped tin oxide thin film composition (100) for use in optical limiting applications, comprising tin chloride dihydrate (204) as a host metal-oxide precursor (104) and nickel chloride hexahydrate (206) as a dopant metal precur...