MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202617096371 A) filed by Nissan Chemical Corporation on August 10, 2026, for Coating Film Formation Composition For Foreign Substance Removal, And Semiconductor Substrate.
Inventors include Kamibayashi Satoshi; Moriya Shunsuke; and Kishioka Takahiro.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: Provided is a coating film formation composition for foreign substance removal, said composition being able to form a coating film which contains a polymer and a solvent and can be removed by a removal liquid. [In formula (A), R11 represents a single bond or a divalent group having 1 to 4 carbon atoms, R1...