MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202641087497 A) filed by Saveetha Engineering College on July 17, 2026, for Behaviour- Aware Human Resource Analytics Platform For Employee Retention.
Inventors include Dr. Karthick. K. K; and Dr. N. Udaya Prakash.
The application for the patent was published on August 07, 2026, under issue no. 32/2026.
Abstract: ABSTRACT The present invention relates to a Behaviour-Aware Human Resource Analytics Platform for Employee-Retention, designed to intelligently monitor, analyze, and predict employee retention risks through continuous evaluation of multidimensional behavioural patterns. The platform acquires employee-related information from diverse organiz...