MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202541000993 A) filed by Jeyavishnu K on January 05, 2025, for Automated Resistance-Based Vial Identification Photometric System.
Inventors include Jeyavishnu K; and Manish Malhan.
The application for the patent was published on July 10, 2026, under issue no. 28/2026.
Abstract: ABSTRACT Automated Resistance-Based Vial Identification photometric System The present invention discloses a method for identifying and quantifying analyte concentration in a sample using a resistance-based vial identification system. Each vial contains a resistance material [102] positioned at a non-light path location to influence its electrical resistance. Upon insertion i...