Intellectual Property India Publishes Patent Application for Aqueous Organic Zinc-Rich Coating Material Having Excellent Ability To Suppress Generation Of Hydrogen Gas

MUMBAI, India, Oct. 26 -- Intellectual Property India has published a patent application (202617090858 A) filed by Roval Corporation on July 27, 2026, for Aqueous Organic Zinc-Rich Coating Material Having Excellent Ability To Suppress Generation Of Hydrogen Gas.

Inventors include Nakaya, Yasuyuki; Nakamura, Kenichi; and Matsumoto, Hirofumi.

The application for the patent was published on October 23, 2026, under issue no. 43/2026.

Abstract: The present invention provides an aqueous zinc-rich coating material that can suppress the generation of hydrogen gas, as well as achieve low toxicity and high corrosion resistance for a steel material or the like. The present invention contains 70 wt% or more of a zinc powder and 0.02 wt% or more of a...