Intellectual Property India Publishes Patent Application for Apparatus For Absorbing Residual Silicon, Apparatus For Growing Silicon Ingot With Same, And Method For Removing Residual Silicon From Crucible

MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202647087006 A) filed by Hanwha Solutions Corporation on July 16, 2026, for Apparatus For Absorbing Residual Silicon, Apparatus For Growing Silicon Ingot With Same, And Method For Removing Residual Silicon From Crucible.

Inventors include Pang, Il Sun; Park, Hyung Ju; Kim, Yang Kyu; Kim, Sang Woong; Han, Sang Beom; Choi, Jae Hyoung; Lee, Young Hwan; Lee, Sung Gu; Park, Gwan Yong; Cho, Dong Je; Kim, Chang Yeon; Shin, Sung Sub; Jeong, Beom Su; Cheon, Byeong Cheol; Kim, Jung Min; Jang, Jung Gil; Jeong, Sang Gyun; Lee, Gwang Hun; Lee, Young Min; and Jeon, Han Woong.

The application for the patent was published on August 07, 2026, under issue no. 32/2026....