MUMBAI, India, Oct. 26 -- Intellectual Property India has published a patent application (202641123180 A) filed by Prayaga Venkata Ramakrishna on October 14, 2026, for A System And Method For Performing Extreme Ultraviolet Lithography Using Ion-Beam Generation And Optical Scanning.
Inventor includes Prayaga Vaibhav Nischal.
The application for the patent was published on October 23, 2026, under issue no. 43/2026.
Abstract: A system and method for performing extreme ultraviolet lithography using ion-beam generation and optical scanning is disclosed. The system (100) includes a light source region within a chamber. A target assembly (104) includes a crucible (106) retaining tin and an induction coil (108) heating tin to a molten state. An ...