Intellectual Property India Publishes Patent Application for A Method Of Manufacturing A Nozzle Assembly, Comprising Weakening A Wafer At At Least Two Focal Zones In The Depth Direction By Focusing A Laser Beam

MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202617057076 A) filed by Micronit Holding B. V. on May 05, 2026, for A Method Of Manufacturing A Nozzle Assembly, Comprising Weakening A Wafer At At Least Two Focal Zones In The Depth Direction By Focusing A Laser Beam.

Inventors include Oonk, Johannes; Bosman, Mathijs Christian; Vermeer, Rolf; and Blom, Marko Theodoor.

The application for the patent was published on June 26, 2026, under issue no. 26/2026.

Abstract: The invention relates to a method of manufacturing at least one nozzle assembly for atomising a fluid. The method comprises a) providing the at least one nozzle assembly pre-arranged in a wafer; and b) separating the at least one nozzle ...