Intellectual Property India Publishes Patent Application for A Method For The Manufacture Of A Degradable Polymer Composition, And A Kit Of Parts For Said Manufacture

MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202647104931 A) filed by Polymateria Limited on September 01, 2026, for A Method For The Manufacture Of A Degradable Polymer Composition, And A Kit Of Parts For Said Manufacture.

Inventors include Hill, Gavin; Huynh, Florence; and Van Den Oudenhoven, Roy.

The application for the patent was published on September 18, 2026, under issue no. 38/2026.

Abstract: There is provided a method for the manufacture of a degradable polymer composition comprising a copolymer or homopolymer of polyethylene and/or polypropylene, and: (i) a first component which is one or more transition metal compounds, wherein the transition metal is selected from iron, manganese,...