MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202521086098 A) filed by Indian Institute Of Technology Gandhinagar on September 10, 2025, for A Method For The Deposition Of Niobium Nitride Film On A Substrate.
Inventors include Dabhi, Dushyant; and Panda, Emila.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: ABSTRACT The present disclosure relates to a method for depositing a niobium nitride (NbN) film on a substrate. The method of the present disclosure uses radio frequency (RF) magnetron sputtering for deposition of the NbN film. The method of the present disclosure avoids the use of ultra-high vacuum systems, buffer layers, and expensive su...