Intellectual Property India Publishes Patent Application for A Manufacturing System Including A Machine Learning Feedback Loop

MUMBAI, India, June 24 -- Intellectual Property India has published a patent application (202411093096 A) filed by Bagavathi, Magesh; Karajagl, Nachiket; Paliwal, Sagar; Verma, Aditya; and Vuduturi, Karthik on November 28, 2024, for A Manufacturing System Including A Machine Learning Feedback Loop.

Inventors include Bagavathi, Magesh; Karajagl, Nachiket; Paliwal, Sagar; Verma, Aditya; and Vuduturi, Karthik.

The application for the patent was published on June 12, 2026, under issue no. 24/2026.

Abstract: Systems and methods analyze data received from assets in a manufacturing environment, determine a first parameter is over or under a first predetermined threshold for an asset using a first machine learning model deployed on the manufactu...