Intellectual Property India Publishes Patent Application for A Chemically Robust Microporous Zn-Mof For C2h2 Separation From Co2 And Industrially Relevant Four Component Gas Mixtures

MUMBAI, India, June 22 -- Intellectual Property India has published a patent application (202531031067 A) filed by Indian Institute Of Technology Kharagpur on March 29, 2025, for A Chemically Robust Microporous Zn-Mof For C2h2 Separation From Co2 And Industrially Relevant Four Component Gas Mixtures.

Inventors include Dr. Madhab C Das; Bikram Pramanik; and Rupam Sahoo.

The application for the patent was published on June 12, 2026, under issue no. 24/2026.

Abstract: Abstract Title: A Chemically Robust Microporous Zn-MOF for C2H2 Separation from CO2 and Industrially Relevant Four Component Gas Mixtures The invention scopes a 3D-microporous metal–organic framework (MOF) comprising Zn-based metal–organic interpenetrative framework of mixed l...