MUMBAI, India, Nov. 14 -- Intellectual Property India has published a patent application (202517067682 A) filed by Cyclopure, Inc., Chicago, on July 16, for 'regeneration of polymeric cyclodextrin adsorbents.'
Inventor(s) include Ling, Yuhan; Barin, Gokhan; Teodoro, Olivia Therese; and Wang, Ri.
The application for the patent was published on Nov. 14, under issue no. 46/2025.
According to the abstract released by the Intellectual Property India: "Methods for removing PFAS from cationic CDP adsorbents having adsorbed PFAS are provided. The method comprises contacting a volume of the cationic CDP adsorbent with a regeneration medium and separating the cationic CDP adsorbent from the regeneration medium."
The patent application was interna...