Intellectual Property India Publishes Patent Application for 'Patterning Using Monomer Based Sacrificial Material Liftoff' Filed by Bae Systems Information And Electronic Systems Integration Inc.

MUMBAI, India, March 14 -- Intellectual Property India has published a patent application (202517128572 A) filed by Bae Systems Information And Electronic Systems Integration Inc., New Hampshire, U.S.A., on Dec. 18, 2025, for 'patterning using monomer based sacrificial material liftoff.'

Inventor(s) include Wyckoff, Nathaniel P; Terry, Benjamin; and Warren, Alexander S.

The application for the patent was published on March 13, under issue no. 11/2026.

According to the abstract released by the Intellectual Property India: "A method includes forming a plurality of islands of first material on a plurality of first sections of a layer. A plurality of second sections of the layer are not covered by the first material. The method further inclu...