Intellectual Property India Publishes Patent Application for 'Machine Learning System For Clothing Wear Duration Prediction' Filed by Vellore Institute Of Technology

MUMBAI, India, Jan. 2 -- Intellectual Property India has published a patent application (202541122913 A) filed by Vellore Institute Of Technology, Vellore, Tamil Nadu, on Dec. 5, 2025, for 'machine learning system for clothing wear duration prediction.'

Inventor(s) include Dr. Lokeshkumar Ramasamy; and Mr. Nikhil Naganagouda Patil.

The application for the patent was published on Jan. 2, under issue no. 01/2026.

According to the abstract released by the Intellectual Property India: "The present disclosure provides a computer-implemented method (100) for predicting clothing wear duration using machine learning. The method (100) includes collecting clothing attribute data (102) including material type, fabric thickness measured in grams per...