Intellectual Property India Publishes Patent Application for 'Adaptive Layer Deposition Strategy For Reducing Mechanical Anisotropy In Fused Deposition Modeling (FDM) Additive Manufacturing' Filed by Sr University

MUMBAI, India, April 17 -- Intellectual Property India has published a patent application (202641043108 A) filed by Sr University, Warangal, Telangana, on April 4, for 'adaptive layer deposition strategy for reducing mechanical anisotropy in fused deposition modeling (fdm) additive manufacturing.'

Inventor(s) include Dr. Yogesh Shrivastava; and Durgesh Nandan.

The application for the patent was published on April 17, under issue no. 16/2026.

According to the abstract released by the Intellectual Property India: "A strategy of adaptive layer deposition of diminishing mechanical anisotropy in Fused Deposition Modeling (FDM) additive manufacturing is revealed. Its invention incorporates a structural analysis unit, an anisotropy mapping proc...