Intellectual Property India Publishes Patent Application for 'A Process And A System For The Removal Of Moisture From Methyl Tertiary Butyl Ether' Filed by Reliance Industries Limited

MUMBAI, India, Nov. 21 -- Intellectual Property India has published a patent application (202421038532 A) filed by Reliance Industries Limited, Maharashtra, on May 16, 2024, for 'a process and a system for the removal of moisture from methyl tertiary butyl ether.'

Inventor(s) include Sidhpuria Kalpesh Bhikhubhai; Priya, Surbhi; Lande, Sharad Vasudeorao; and Jasra, Raksh Vir.

The application for the patent was published on Nov. 21, under issue no. 47/2025.

According to the abstract released by the Intellectual Property India: "The present disclosure relates to a process and a system (100) for the removal of moisture from MTBE. The process comprises the preparation and activation of a pore-engineered nano-porous binderless adsorbent, follo...