Intellectual Property India Publishes Patent Application for 'A Method For Halogen-Free One-Pot Synthesis Of Nitrogen-Doped Holey Carbon Nanosheets' Filed by Bharrathi Sree G; and Sree Varshan G

MUMBAI, India, April 17 -- Intellectual Property India has published a patent application (202641043126 A) filed by Bharrathi Sree G; and Sree Varshan G, Kovilpatti, Tamil Nadu, on April 4, for 'a method for halogen-free one-pot synthesis of nitrogen-doped holey carbon nanosheets.'

Inventor(s) include Sree Varshan G.

The application for the patent was published on April 17, under issue no. 16/2026.

According to the abstract released by the Intellectual Property India: "The present invention provides a halogen-free, one-pot method (100) for synthesizing nitrogen-doped holey carbon nanosheets functionalized with multi-metallic oxides. A precursor composition (102) comprising expandable graphite, an organic nitrogen-rich blowing agent, an a...