MUMBAI, India, Nov. 21 -- Intellectual Property India has published a patent application (202517097991 A) filed by Basf Se, Ludwigshafen am Rhein, Germany, on Oct. 10, for '3d network structure with high resilience, soft touch feeling and good quietness and method of preparing the same.'
Inventor(s) include Jin, Hai Liang; Yan, Hui Zhi; and Weng, Jun.
The application for the patent was published on Nov. 21, under issue no. 47/2025.
According to the abstract released by the Intellectual Property India: "The present invention relates to a 3D network structure comprising a thermoplastic polyurethane, wherein the thermoplastic polyurethane has a hardphase ratio ranging from 10wt% to 40wt% and wherein the thermoplastic polyurethane has a proc...