INTERNATIONAL PATENT: NTT, INC., ＮＴＴ株式会社 FILES APPLICATION FOR "IMAGE PROCESSING DEVICE"

GENEVA, March 2 -- NTT, INC. (5-1, Otemachi 1-chome, Chiyoda-ku, Tokyo1008116), ＮＴＴ株式会社 (東京都千代田区&#2282... Read More

INTERNATIONAL PATENT: NTT, INC., ＮＴＴ株式会社 FILES APPLICATION FOR "RETRIEVAL DEVICE"

GENEVA, March 2 -- NTT, INC. (5-1, Otemachi 1-chome, Chiyoda-ku, Tokyo1008116), ＮＴＴ株式会社 (東京都千代田区&#2282... Read More

INTERNATIONAL PATENT: NISSAN MOTOR CO., LTD., 日産自動車株式会社 FILES APPLICATION FOR "PARKING/STOPPING CONTROL METHOD, PARKING/STOPPING CONTROL DEVICE AND PARKING/STOPPING CONTROL SYSTEM"

GENEVA, March 2 -- NISSAN MOTOR CO., LTD. (2, Takara-cho, Kanagawa-ku, Yokohama-shi, Kanagawa2210023), 日産自動車株式会社 (神奈&#24029... Read More

INTERNATIONAL PATENT: NTT, INC., ＮＴＴ株式会社 FILES APPLICATION FOR "SOURCE CODE CONVERSION DEVICE, SOURCE CODE CONVERSION METHOD AND PROGRAM"

GENEVA, March 2 -- NTT, INC. (5-1, Otemachi 1-chome, Chiyoda-ku, Tokyo1008116), ＮＴＴ株式会社 (東京都千代田区&#2282... Read More

INTERNATIONAL PATENT: AHRESTY CORPORATION, 株式会社アーレスティ FILES APPLICATION FOR "ANALYSIS PROGRAM AND CASTING ANALYSIS METHOD"

GENEVA, March 2 -- AHRESTY CORPORATION (1-2, Nakabara, Mitsuya-cho, Toyohashi-shi, Aichi4413114), 株式会社アーレスティ (愛知&#30... Read More

INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "SLURRY AND POLISHING METHOD"

GENEVA, March 2 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都&#28... Read More

INTERNATIONAL PATENT: NTT, INC., ＮＴＴ株式会社 FILES APPLICATION FOR "MODEL GENERATION DEVICE AND MODEL GENERATION METHOD"

GENEVA, March 2 -- NTT, INC. (5-1, Otemachi 1-chome, Chiyoda-ku, Tokyo1008116), ＮＴＴ株式会社 (東京都千代田区&#2282... Read More

INTERNATIONAL PATENT: NTT DOCOMO, INC., 株式会社ＮＴＴドコモ FILES APPLICATION FOR "TERMINAL AND MEASUREMENT METHOD"

GENEVA, March 2 -- NTT DOCOMO, INC. (11-1, Nagatacho 2-chome, Chiyoda-ku, Tokyo1006150), 株式会社ＮＴＴドコモ (東京都&#213... Read More

INTERNATIONAL PATENT: HITACHI HIGH-TECH CORPORATION, 株式会社日立ハイテク FILES APPLICATION FOR "PLASMA PROCESSING DEVICE, PLASMA PROCESSING METHOD AND ETCHING SYSTEM"

GENEVA, March 2 -- HITACHI HIGH-TECH CORPORATION (17-1, Toranomon 1-chome, Minato-ku, Tokyo1056409), 株式会社日立ハイテク (東京&... Read More

INTERNATIONAL PATENT: MITSUBISHI ELECTRIC CORPORATION, 三菱電機株式会社 FILES APPLICATION FOR "METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE"

GENEVA, March 2 -- MITSUBISHI ELECTRIC CORPORATION (7-3, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008310), 三菱電機株式会社 (東京都&#2131... Read More

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