Exclusive

Publication

Byline

Location

INTERNATIONAL PATENT: DAIKIN INDUSTRIES, LTD., ダイキン工業株式会社 FILES APPLICATION FOR "FLOW PATH MEMBER MANUFACTURING METHOD, FLOW PATH MEMBER AND HEAT EXCHANGER"

GENEVA, April 6 -- DAIKIN INDUSTRIES, LTD. (Osaka Umeda Twin Towers South, 1-13-1, Umeda, Kita-ku, Osaka-shi, Osaka5300001), ダイキン工業株式会&#3... Read More


INTERNATIONAL PATENT: KYOTO UNIVERSITY, 国立大学法人京都大学 FILES APPLICATION FOR "BE3 AUTO DEGRADATION INDUCING AGENT AND THERAPEUTIC DRUG FOR INFECTIOUS DISEASE CONTAINING SAME"

GENEVA, April 6 -- KYOTO UNIVERSITY (36-1, Yoshida-honmachi, Sakyo-ku, Kyoto-shi, Kyoto6068501), 国立大学法人京都大学 (京都&#242... Read More


INTERNATIONAL PATENT: BANDAI CO., LTD., 株式会社バンダイ FILES APPLICATION FOR "STOREFRONT ADVERTISEMENT BODY"

GENEVA, April 6 -- BANDAI CO., LTD. (4-8, Komagata 1-chome, Taito-ku, Tokyo1118081), 株式会社バンダイ (東京都台東区&... Read More


INTERNATIONAL PATENT: SHARP KABUSHIKI KAISHA FILES APPLICATION FOR "MSG3 TRANSMISSION CAPABILITY REPORT IN RANDOM ACCESS PROCEDURE FOR AMBIENT IOT"

GENEVA, April 6 -- SHARP KABUSHIKI KAISHA (1, Takumi-cho, Sakai-ku, Sakai City, Osaka5908522) filed a patent application (PCT/JP2025/026200) for "MSG3 TRANSMISSION CAPABILITY REPORT IN RANDOM ACCESS P... Read More


INTERNATIONAL PATENT: NEC CORPORATION, 日本電気株式会社 FILES APPLICATION FOR "ADVICE PROVISION DEVICE, ADVICE PROVISION METHOD, PROGRAM AND EVALUATION DEVICE"

GENEVA, April 6 -- NEC CORPORATION (7-1, Shiba 5-chome, Minato-ku, Tokyo1088001), 日本電気株式会社 (東京都港区芝&#20... Read More


INTERNATIONAL PATENT: RAPIDUS CORPORATION, RAPIDUS株式会社 FILES APPLICATION FOR "SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE"

GENEVA, April 6 -- RAPIDUS CORPORATION (4-1, Kojimachi, Chiyoda-ku, Tokyo1020083), Rapidus株式会社 (東京都&#2... Read More


INTERNATIONAL PATENT: JFE STEEL CORPORATION, JFEスチール株式会社 FILES APPLICATION FOR "METHOD FOR PREDICTING LIFE OF REFRACTORY"

GENEVA, April 6 -- JFE STEEL CORPORATION (2-3, Uchisaiwai-cho 2-chome, Chiyoda-ku, Tokyo1000011), JFEスチール株式会社 (東&#20... Read More


INTERNATIONAL PATENT: OSAKA GAS CO., LTD., 大阪瓦斯株式会社 FILES APPLICATION FOR "EVALUATION SYSTEM AND EVALUATION PROGRAM"

GENEVA, April 6 -- OSAKA GAS CO., LTD. (1-2, Hiranomachi 4-chome, Chuo-ku, Osaka-shi, Osaka5410046), 大阪瓦斯株式会社 (大阪府大&... Read More


INTERNATIONAL PATENT: NOK CORPORATION, NOK株式会社 FILES APPLICATION FOR "RUBBER COMPOSITION FOR HIGH-VOLTAGE ELECTRICAL INSULATOR AND RUBBER MOLDED ARTICLE"

GENEVA, April 6 -- NOK CORPORATION (12-15, Shibadaimon 1-chome, Minato-ku, Tokyo1058585), NOK株式会社 (東京都港区芝&#22... Read More


INTERNATIONAL PATENT: KOKUSAI ELECTRIC CORPORATION, 株式会社KOKUSAI ELECTRIC FILES APPLICATION FOR "SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, PROGRAM AND SUBSTRATE PROCESSING APPARATUS"

GENEVA, April 6 -- KOKUSAI ELECTRIC CORPORATION (1-9-5 Otemachi, Chiyoda-ku, Tokyo1000004), 株式会社KOKUSAI E&#65... Read More