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International Patent: METHOD FOR MANUFACTURING Cu-Sn-CONTAINING STEEL

GENEVA, Sept. 18 -- JFE STEEL CORPORATION filed a patent application (JP2026/006998) for “METHOD FOR MANUFACTURING Cu-Sn-CONTAINING STEEL”. With publication no. WO/2026/186567, here are the other deta... Read More


International Patent: METHOD FOR MANUFACTURING Cu-Sn-CONTAINING STEEL

GENEVA, Sept. 18 -- JFE STEEL CORPORATION filed a patent application (JP2026/006998) for “METHOD FOR MANUFACTURING Cu-Sn-CONTAINING STEEL”. With publication no. WO/2026/186567, here are the other deta... Read More


International Patent: ACTINIC RAY–SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

GENEVA, Sept. 18 -- FUJIFILM CORPORATION filed a patent application (JP2026/007003) for “ACTINIC RAY–SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METH... Read More


International Patent: ACTINIC RAY–SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

GENEVA, Sept. 18 -- FUJIFILM CORPORATION filed a patent application (JP2026/007003) for “ACTINIC RAY–SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METH... Read More


International Patent: ACTINIC RAY–SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

GENEVA, Sept. 18 -- FUJIFILM CORPORATION filed a patent application (JP2026/006955) for “ACTINIC RAY–SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND METHOD... Read More


International Patent: ACTINIC RAY–SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

GENEVA, Sept. 18 -- FUJIFILM CORPORATION filed a patent application (JP2026/006955) for “ACTINIC RAY–SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN-FORMING METHOD, AND METHOD... Read More


International Patent: ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD

GENEVA, Sept. 18 -- FUJIFILM CORPORATION filed a patent application (JP2026/006957) for “ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND ELECT... Read More


International Patent: ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD

GENEVA, Sept. 18 -- FUJIFILM CORPORATION filed a patent application (JP2026/006957) for “ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND ELECT... Read More


International Patent: ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE

GENEVA, Sept. 18 -- FUJIFILM CORPORATION filed a patent application (JP2026/006967) for “ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR FORMING PATTERN, AND ME... Read More


International Patent: ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE

GENEVA, Sept. 18 -- FUJIFILM CORPORATION filed a patent application (JP2026/006967) for “ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR FORMING PATTERN, AND ME... Read More