ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,397, issued on July 21, was assigned to MACRONIX INTERNATIONAL Co. LTD. (Hsinchu, Taiwan). "Vertical 3D cross point memory" was invented by... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,398, issued on July 21, was assigned to Massachusetts Institute of Technology (Cambridge, Mass.). "Transistor structure and methods of form... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,399, issued on July 21, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Methods and systems for filling a gap" was invented by ... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,400, issued on July 21, was assigned to Versum Materials US LLC (Tempe, Ariz.). "Composition and methods using same for carbon doped silico... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,401, issued on July 21, was assigned to Resonac Corp. (Tokyo). "Etching gas, etching method, and method for producing semiconductor device"... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,402, issued on July 21, was assigned to CENTRAL GLASS COMPANY Ltd. (Yamaguchi, Japan). "Surface treatment method, dry etching method, clean... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,403, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Halogen-free etching of silicon nitride" was invente... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,404, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Methods of selectively etching silicon nitride" was ... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,405, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Purge system to clean wafer backside for ring suscep... Read More
ALEXANDRIA, Va., July 21 -- United States Patent no. 12,690,406, issued on July 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Spacer patterning process with flat top profile" was... Read More