Japan, Jan. 23 -- CHEMOCENTRYX INC has got intellectual property rights for 'METHOD OF TREATING C3 GLOMERULOPATHY.' Other related details are as follows: Application Number: JP,2021-129774 Category ... Read More
Japan, Jan. 23 -- BOEING CO has got intellectual property rights for 'INKJET PRINTING SYSTEM HAVING DYNAMICALLY CONTROLLED MENISCUS PRESSURE.' Other related details are as follows: Application Number... Read More
Japan, Jan. 23 -- SAMSUNG DISPLAY CO LTD has got intellectual property rights for 'ORGANIC LIGHT EMITTING ELEMENT AND ELECTRONIC DEVICE INCLUDING THE SAME.' Other related details are as follows: Appl... Read More
Japan, Jan. 23 -- UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY DEPARTMENT OF HEALTH AND HUMAN SERVICES:THE,FUJIFILM CELLULAR DYNAMICS INC has got intellectual property rights for 'METHOD F... Read More
Japan, Jan. 23 -- CAMBRICON TECHNOLOGIES CO LTD has got intellectual property rights for 'DATA PROCESSING METHOD, APPARATUS, AND RELATED PRODUCT.' Other related details are as follows: Application Nu... Read More
Japan, Jan. 23 -- KOBAYASHI PHARMACEUTICAL CO LTD has got intellectual property rights for 'FAT REDUCER.' Other related details are as follows: Application Number: JP,2021-074966 Category (FI): A61K... Read More
Japan, Jan. 23 -- NIPPON STEEL WELDING & ENGINEERING COLTD has got intellectual property rights for 'FLUX-CORED WIRE FOR SELF-SHIELDED ARC WELDING.' Other related details are as follows: Application ... Read More
Japan, Jan. 23 -- SUMITOMO CHEMICAL CO LTD has got intellectual property rights for 'COMPOUND, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN.' Other related details are as follows... Read More
Japan, Jan. 23 -- SUMITOMO CHEMICAL CO LTD,DONGWOO FINE-CHEM CO LTD has got intellectual property rights for 'COMPOUND.' Other related details are as follows: Application Number: JP,2021-056964 Cate... Read More
Japan, Jan. 23 -- SUMITOMO CHEMICAL CO LTD has got intellectual property rights for 'COMPOUND, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN.' Other related details are as follows... Read More