ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,744, issued on June 30, was assigned to SEIKO EPSON Corp. (Tokyo). "Projector with improved arrangement of cooling mechanism" was invented ... और पढ़ें
ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,746, issued on June 30, was assigned to Amazon Technologies Inc. (Seattle). "Hybrid lens system for projectors" was invented by Wubin Pang ... और पढ़ें
ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,747, issued on June 30, was assigned to Disney Enterprises Inc. (Burbank, Calif.). "System for generating a 360 degree viewable image on la... और पढ़ें
ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,748, issued on June 30, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo). "Chemically amplified resist composition and patterning proces... और पढ़ें
ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,749, issued on June 30, was assigned to Dai Nippon Printing Co. Ltd. (Tokyo). "Curable resin composition for silicon-containing resist, pat... और पढ़ें
ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,750, issued on June 30, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "System and method for supplying and... और पढ़ें
ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,751, issued on June 30, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Storage system for storing phot... और पढ़ें
ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,752, issued on June 30, was assigned to Gigaphoton Inc. (Tochigi, Japan). "Extreme ultraviolet light generation system and electronic devic... और पढ़ें
ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,753, issued on June 30, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "EUV multi-mirror arrangement" was invented by Ralf Amel... और पढ़ें
ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,754, issued on June 30, was assigned to Canon K.K. (Tokyo). "Method for improving accuracy of imprint force application in imprint lithogra... और पढ़ें