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INTERNATIONAL PATENT: SHIN-ETSU CHEMICAL CO., LTD., 信越化学工業株式会社 FILES APPLICATION FOR "THERMALLY CONDUCTIVE SILICONE COMPOSITION"

GENEVA, Dec. 30 -- SHIN-ETSU CHEMICAL CO., LTD. (4-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1000005), 信越化学工業株式会社 (東京&... Read More


INTERNATIONAL PATENT: NITERRA MATERIALS CO., LTD., 株式会社NITERRA MATERIALS FILES APPLICATION FOR "BONDED BODY, CERAMIC CIRCUIT SUBSTRATE AND SEMICONDUCTOR DEVICE"

GENEVA, Dec. 30 -- NITERRA MATERIALS CO., LTD. (8, Shinsugita-cho, Isogo-ku, Yokohama-shi, Kanagawa2350032), 株式会社Niterra&#1... Read More


INTERNATIONAL PATENT: CANON KABUSHIKI KAISHA, キヤノン株式会社 FILES APPLICATION FOR "REACTION DEVICE AND STABILIZATION MEMBER"

GENEVA, Dec. 30 -- CANON KABUSHIKI KAISHA (30-2, Shimomaruko 3-chome, Ohta-ku, Tokyo1468501), キヤノン株式会社 (東京都大田... Read More


INTERNATIONAL PATENT: KURARAY CO., LTD., 株式会社クラレ FILES APPLICATION FOR "POLYAMIDE BLOCK COPOLYMER, POLYAMIDE BLOCK COPOLYMER COMPOSITION AND MOLDED BODY"

GENEVA, Dec. 30 -- KURARAY CO., LTD. (1621, Sakazu, Kurashiki-shi, Okayama7100801), 株式会社クラレ (岡山県倉敷市酒&#... Read More


INTERNATIONAL PATENT: SCREEN HOLDINGS CO., LTD., 株式会社SCREENホールディングス FILES APPLICATION FOR "SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD"

GENEVA, Dec. 30 -- SCREEN HOLDINGS CO., LTD. (Tenjinkita-machi 1-1, Teranouchi-agaru 4-chome, Horikawa-dori, Kamigyo-ku, Kyoto-shi, Kyoto6028585), 株式会社SC&#653... Read More


INTERNATIONAL PATENT: JSR CORPORATION, JSR株式会社 FILES APPLICATION FOR "METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND FILM-FORMING COMPOSITION"

GENEVA, Dec. 30 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), JSR株式会社 (東京都港区東... Read More


INTERNATIONAL PATENT: TOAGOSEI CO., LTD., 東亞合成株式会社 FILES APPLICATION FOR "BINDER FOR SECONDARY BATTERY POSITIVE ELECTRODE, USES OF SAME AND METHOD FOR MANUFACTURING BINDER FOR SECONDARY BATTERY POSITIVE ELECTRODE"

GENEVA, Dec. 30 -- TOAGOSEI CO., LTD. (1-14-1, Nishi-Shimbashi, Minato-ku, Tokyo1058419), 東亞合成株式会社 (東京都港区&#35... Read More


INTERNATIONAL PATENT: MURATA MANUFACTURING CO., LTD., 株式会社村田製作所 FILES APPLICATION FOR "FILTER CIRCUIT AND COMMON MODE NOISE FILTER"

GENEVA, Dec. 30 -- MURATA MANUFACTURING CO., LTD. (10-1, Higashikotari 1-chome, Nagaokakyo-shi, Kyoto6178555), 株式会社村田製作所 (京&#37117... Read More


INTERNATIONAL PATENT: MIRAXIA EDGE TECHNOLOGY CORPORATION, ミラクシアエッジテクノロジー株式会社 FILES APPLICATION FOR "NON-CONTACT POWER SUPPLY SYSTEM"

GENEVA, Dec. 30 -- MIRAXIA EDGE TECHNOLOGY CORPORATION (1 Kotari-yakemachi, Nagaokakyo City, Kyoto6178520), ミラクシアエッジテクノ&#12... Read More


INTERNATIONAL PATENT: ENEOS MATERIALS CORPORATION, 株式会社ENEOSマテリアル, RENAISIS CO., LTD., 株式会社ルネシス FILES APPLICATION FOR "SLURRY FOR POWER STORAGE DEVICE POSITIVE ELECTRODE, POSITIVE ELECTRODE FOR POWER STORAGE DEVICE AND POWER STORAGE DEVICE"

GENEVA, Dec. 30 -- ENEOS MATERIALS CORPORATION (5-2, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057109), 株式会社ENEOSマテ&#1252... Read More