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International Patent: SYSTEM AND METHOD FOR ADJUSTING AN ION BEAM

GENEVA, Sept. 18 -- APPLIED MATERIALS, INC. filed a patent application (US2025/050061) for “SYSTEM AND METHOD FOR ADJUSTING AN ION BEAM”. With publication no. WO/2026/187404, here are the other detail... Read More


International Patent: METHODS FOR RESHAPING MASKING LAYER OPENINGS

GENEVA, Sept. 18 -- APPLIED MATERIALS, INC. filed a patent application (US2025/050074) for “METHODS FOR RESHAPING MASKING LAYER OPENINGS”. With publication no. WO/2026/187405, here are the other detai... Read More


International Patent: METHODS FOR RESHAPING MASKING LAYER OPENINGS

GENEVA, Sept. 18 -- APPLIED MATERIALS, INC. filed a patent application (US2025/050074) for “METHODS FOR RESHAPING MASKING LAYER OPENINGS”. With publication no. WO/2026/187405, here are the other detai... Read More


International Patent: COMPOSITE SILICIDE FOR 3D DRAM DEVICES

GENEVA, Sept. 18 -- APPLIED MATERIALS, INC. filed a patent application (US2025/050548) for “COMPOSITE SILICIDE FOR 3D DRAM DEVICES”. With publication no. WO/2026/187406, here are the other details rel... Read More


International Patent: COMPOSITE SILICIDE FOR 3D DRAM DEVICES

GENEVA, Sept. 18 -- APPLIED MATERIALS, INC. filed a patent application (US2025/050548) for “COMPOSITE SILICIDE FOR 3D DRAM DEVICES”. With publication no. WO/2026/187406, here are the other details rel... Read More


International Patent: METHODS OF TRAINING AND USING A MACHINE LEARNING MODEL FOR REDUCING READ ERRORS IN A MEMORY DEVICE

GENEVA, Sept. 18 -- MICROCHIP TECHNOLOGY INCORPORATED filed a patent application (US2025/049661) for “METHODS OF TRAINING AND USING A MACHINE LEARNING MODEL FOR REDUCING READ ERRORS IN A MEMORY DEVICE... Read More


International Patent: METHODS OF TRAINING AND USING A MACHINE LEARNING MODEL FOR REDUCING READ ERRORS IN A MEMORY DEVICE

GENEVA, Sept. 18 -- MICROCHIP TECHNOLOGY INCORPORATED filed a patent application (US2025/049661) for “METHODS OF TRAINING AND USING A MACHINE LEARNING MODEL FOR REDUCING READ ERRORS IN A MEMORY DEVICE... Read More


International Patent: INTEGRATED PLASMA ACTIVATION MEASUREMENT FOR ENHANCED PLASMA PROCESS SYSTEM

GENEVA, Sept. 18 -- APPLIED MATERIALS, INC. filed a patent application (US2025/049782) for “INTEGRATED PLASMA ACTIVATION MEASUREMENT FOR ENHANCED PLASMA PROCESS SYSTEM”. With publication no. WO/2026/1... Read More


International Patent: INTEGRATED PLASMA ACTIVATION MEASUREMENT FOR ENHANCED PLASMA PROCESS SYSTEM

GENEVA, Sept. 18 -- APPLIED MATERIALS, INC. filed a patent application (US2025/049782) for “INTEGRATED PLASMA ACTIVATION MEASUREMENT FOR ENHANCED PLASMA PROCESS SYSTEM”. With publication no. WO/2026/1... Read More


International Patent: FULLY ISOLATED SUPER VIA IN WAFER STACKING STRUCTURE

GENEVA, Sept. 18 -- APPLIED MATERIALS, INC. filed a patent application (US2025/049995) for “FULLY ISOLATED SUPER VIA IN WAFER STACKING STRUCTURE”. With publication no. WO/2026/187403, here are the oth... Read More