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INTERNATIONAL PATENT: EDUCATIONAL FOUNDATION OF OSAKA MEDICAL AND PHARMACEUTICAL UNIVERSITY, 学校法人大阪医科薬科大学 FILES APPLICATION FOR "LIGHT IRRADIATION DEVICE FOR PHOTODYNAMIC THERAPY"

GENEVA, Feb. 17 -- EDUCATIONAL FOUNDATION OF OSAKA MEDICAL AND PHARMACEUTICAL UNIVERSITY (2-7 Daigaku-machi, Takatsuki City, Osaka5698686), 学校法人大阪医&#31... Read More


INTERNATIONAL PATENT: SUMITOMO ELECTRIC INDUSTRIES, LTD., 住友電気工業株式会社 FILES APPLICATION FOR "FUSION SPLICING DEVICE AND FUSION SPLICING METHOD"

GENEVA, Feb. 17 -- SUMITOMO ELECTRIC INDUSTRIES, LTD. (5-33, Kitahama 4-chome, Chuo-ku, Osaka-shi, Osaka5410041), 住友電気工業株式会社 (&#22... Read More


INTERNATIONAL PATENT: SONY GROUP CORPORATION, ソニーグループ株式会社 FILES APPLICATION FOR "INFORMATION PROCESSING METHOD, INFORMATION PROCESSING PROGRAM AND INFORMATION PROCESSING DEVICE"

GENEVA, Feb. 17 -- SONY GROUP CORPORATION (1-7-1, Konan, Minato-ku, Tokyo1080075), ソニーグループ株式会社 (東京都&#2... Read More


INTERNATIONAL PATENT: KDDI CORPORATION, KDDI株式会社 FILES APPLICATION FOR "TERMINAL DEVICE FOR ACQUIRING SYSTEM INFORMATION IN POWER-SAVING CELLULAR COMMUNICATION NETWORK AND CONTROL METHOD"

GENEVA, Feb. 17 -- KDDI CORPORATION (3-2, Nishi-Shinjuku 2-chome, Shinjuku-ku, Tokyo1638003), KDDI株式会社 (東京都新宿... Read More


INTERNATIONAL PATENT: JAPAN SCIENCE AND TECHNOLOGY AGENCY, 国立研究開発法人科学技術振興機構 FILES APPLICATION FOR "INVERTER CIRCUIT, BISTABLE CIRCUIT, STORAGE CIRCUIT AND PROCESSING CIRCUIT"

GENEVA, Feb. 17 -- JAPAN SCIENCE AND TECHNOLOGY AGENCY (1-8, Hon-cho 4-chome, Kawaguchi-shi, Saitama3320012), 国立研究開発法人科学技&#... Read More


INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "PLASMA PROCESSING DEVICE"

GENEVA, Feb. 17 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東&#2... Read More


INTERNATIONAL PATENT: MURATA MANUFACTURING CO., LTD., 株式会社村田製作所 FILES APPLICATION FOR "CERAMIC COMPOSITION, ELECTRONIC COMPONENT AND METHOD FOR MANUFACTURING CERAMIC COMPOSITION"

GENEVA, Feb. 17 -- MURATA MANUFACTURING CO., LTD. (10-1, Higashikotari 1-chome, Nagaokakyo-shi, Kyoto6178555), 株式会社村田製作所 (京&#37117... Read More


INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "PLASMA PROCESSING SYSTEM AND SUBSTRATE PROCESSING SYSTEM"

GENEVA, Feb. 17 -- TOKYO ELECTRON LIMITED (3-1, Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東&#2... Read More


INTERNATIONAL PATENT: TOKYO ELECTRON LIMITED, 東京エレクトロン株式会社 FILES APPLICATION FOR "PLASMA PROCESSING DEVICE AND POWER SUPPLY SYSTEM"

GENEVA, Feb. 17 -- TOKYO ELECTRON LIMITED (3-1 Akasaka 5-chome, Minato-ku, Tokyo1076325), 東京エレクトロン株式会社 (東&#20... Read More


INTERNATIONAL PATENT: THE UNIVERSITY OF OSAKA, 国立大学法人大阪大学 FILES APPLICATION FOR "ALLOY FOR HYDROGEN-RESISTANT MEMBER, METHOD FOR PRODUCING SAME, HYDROGEN-RESISTANT MEMBER, HYDROGEN-EMBRITTLEMENT-RESISTANT ALLOY AND ALLOY DESIGN METHOD"

GENEVA, Feb. 17 -- THE UNIVERSITY OF OSAKA (1-1, Yamadaoka, Suita-shi, Osaka5650871), 国立大学法人大阪大学 (大阪府吹... Read More