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INTERNATIONAL PATENT: EM LABS, INC., EMラボ株式会社 FILES APPLICATION FOR "OPEN RESONATOR AND ELECTRICAL CONDUCTIVITY MEASUREMENT METHOD USING SAME"

GENEVA, March 10 -- EM LABS, INC. (1-4-13, Mizukasadori, Nagata-ku, Kobe-city, Hyogo6530842), EMラボ株式会社 (兵庫県神戸... Read More


INTERNATIONAL PATENT: FUJITSU GENERAL LIMITED, 株式会社富士通ゼネラル FILES APPLICATION FOR "REFRIGERANT AMOUNT ESTIMATION DEVICE AND AIR CONDITIONER"

GENEVA, March 10 -- FUJITSU GENERAL LIMITED (3-3-17, Suenaga, Takatsu-ku, Kawasaki-shi, Kanagawa2138502), 株式会社富士通ゼネラル (&#31... Read More


INTERNATIONAL PATENT: MURATA MANUFACTURING CO., LTD., 株式会社村田製作所 FILES APPLICATION FOR "MULTILAYER SUBSTRATE AND ELECTRONIC DEVICE"

GENEVA, March 10 -- MURATA MANUFACTURING CO., LTD. (10-1, Higashikotari 1-chome, Nagaokakyo-shi, Kyoto6178555), 株式会社村田製作所 (京&#3711... Read More


INTERNATIONAL PATENT: EAGLE INDUSTRY CO., LTD., イーグル工業株式会社 FILES APPLICATION FOR "SWITCHING VALVE"

GENEVA, March 10 -- EAGLE INDUSTRY CO., LTD. (1-12-15, Shiba-Daimon, Minato-ku, Tokyo1058587), イーグル工業株式会社 (東京&#37117... Read More


INTERNATIONAL PATENT: SONY SEMICONDUCTOR SOLUTIONS CORPORATION, ソニーセミコンダクタソリューションズ株式会社 FILES APPLICATION FOR "LIGHT RADIATION DEVICE AND LIGHT RADIATION SYSTEM"

GENEVA, March 10 -- SONY SEMICONDUCTOR SOLUTIONS CORPORATION (4-14-1 Asahicho, Atsugi-shi, Kanagawa2430014), ソニーセミコンダクタソ&#1... Read More


INTERNATIONAL PATENT: JSR CORPORATION, JSR株式会社 FILES APPLICATION FOR "DIFFRACTIVE OPTICAL ELEMENT"

GENEVA, March 10 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), JSR株式会社 (東京都港区&#26481... Read More


INTERNATIONAL PATENT: SHIMADZU CORPORATION, 株式会社島津製作所 FILES APPLICATION FOR "MANAGEMENT METHOD, PROGRAM AND X-RAY ANALYSIS DEVICE"

GENEVA, March 10 -- SHIMADZU CORPORATION (1, Nishinokyo Kuwabara-cho, Nakagyo-ku, Kyoto-shi, Kyoto6048511), 株式会社島津製作所 (京都&#... Read More


INTERNATIONAL PATENT: NTN CORPORATION, NTN株式会社 FILES APPLICATION FOR "ROLLING BEARING"

GENEVA, March 10 -- NTN CORPORATION (3-6-32, Nakanoshima, Kita-ku, Osaka-shi, Osaka5300005), NTN株式会社 (大阪府大阪市&... Read More


INTERNATIONAL PATENT: FUJIFILM CORPORATION, 富士フイルム株式会社 FILES APPLICATION FOR "PHOTOSENSITIVE COMPOSITION, RESIST FILM, PATTERN FORMING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD"

GENEVA, March 10 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京&#37117... Read More


INTERNATIONAL PATENT: IDEMITSU KOSAN CO.,LTD., 出光興産株式会社 FILES APPLICATION FOR "RESIN COMPOSITION, METHOD FOR PRODUCING RESIN COMPOSITION, COMPOSITE MATERIAL, METHOD FOR PRODUCING COMPOSITE MATERIAL AND MOLDED BODY"

GENEVA, March 10 -- IDEMITSU KOSAN CO.,LTD. (2-1, Otemachi 1-chome, Chiyoda-ku, Tokyo1008321), 出光興産株式会社 (東京都千&#20195... Read More