GENEVA, Oct. 9 -- AGC INC. filed a patent application (JP2026/012561) for “CRYSTALLIZED GLASS”. With publication no. WO/2026/211597, here are the other details related to the patent application: Kin... Read More
GENEVA, Oct. 9 -- DOWA ECO-SYSTEM CO., LTD. filed a patent application (JP2026/012544) for “METHOD FOR RECOVERING COBALT AND NICKEL”. With publication no. WO/2026/211591, here are the other details re... Read More
GENEVA, Oct. 9 -- DOWA ECO-SYSTEM CO., LTD. filed a patent application (JP2026/012546) for “RECOVERY METHOD FOR RECOVERING NICKEL”. With publication no. WO/2026/211593, here are the other details rela... Read More
GENEVA, Oct. 9 -- NIPPON STEEL CORPORATION filed a patent application (JP2026/012550) for “TITANIUM ALLOY FOIL, DISPLAY PANEL, AND METHOD FOR MANUFACTURING DISPLAY PANEL”. With publication no. WO/2026... Read More
GENEVA, Oct. 9 -- SONY SEMICONDUCTOR SOLUTIONS CORPORATION filed a patent application (JP2026/012528) for “OPERATION DEVICE AND IMAGING DEVICE”. With publication no. WO/2026/211588, here are the other... Read More
GENEVA, Oct. 9 -- AESC JAPAN LTD. filed a patent application (JP2026/012542) for “POSITIVE ELECTRODE ACTIVE MATERIAL, POSITIVE ELECTRODE, LITHIUM-ION SECONDARY BATTERY, AND LITHIUM-ION SECONDARY BATTE... Read More
GENEVA, Oct. 9 -- FUJIMI INCORPORATED filed a patent application (JP2026/012493) for “LAPPING METHOD AND COMPOSITION FOR LAPPING PROCESS”. With publication no. WO/2026/211581, here are the other detai... Read More
GENEVA, Oct. 9 -- KAWASAKI JUKOGYO KABUSHIKI KAISHA filed a patent application (JP2026/012498) for “ROBOT CONTROL SYSTEM, CONTROL UNIT, AND ROBOT CONTROL METHOD”. With publication no. WO/2026/211582, ... Read More
GENEVA, Oct. 9 -- KYOTO UNIVERSITY filed a patent application (JP2026/012510) for “ATOM MEASUREMENT METHOD AND ATOM MEASUREMENT SYSTEM”. With publication no. WO/2026/211584, here are the other details... Read More
GENEVA, Oct. 9 -- NISSAN CHEMICAL CORPORATION filed a patent application (JP2026/012473) for “COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND METHOD FOR MANUFACTURING SEMICONDUCT... Read More