INTERNATIONAL PATENT: MITSUI CHEMICALS ICT MATERIA, INC., 三井化学ＩＣＴマテリア株式会社 FILES APPLICATION FOR "ELECTRONIC DEVICE MANUFACTURING METHOD"

GENEVA, April 19 -- MITSUI CHEMICALS ICT MATERIA, INC. (2-2-1 Yaesu, Chuo-ku, Tokyo1040028), 三井化学ＩＣＴマテリア株式&#2... Read More

INTERNATIONAL PATENT: JAPAN DISPLAY INC., 株式会社ジャパンディスプレイ FILES APPLICATION FOR "TILING REFLECTOR"

GENEVA, April 19 -- JAPAN DISPLAY INC. (3-7-1 Nishi-shinbashi, Minato-ku, Tokyo1050003), 株式会社ジャパンディスプレ&#12452... Read More

INTERNATIONAL PATENT: DENSO CORPORATION, 株式会社デンソー FILES APPLICATION FOR "POSITION DETECTION DEVICE"

GENEVA, April 19 -- DENSO CORPORATION (1-1, Showa-cho, Kariya-city, Aichi4488661), 株式会社デンソー (愛知県刈谷市&#2... Read More

INTERNATIONAL PATENT: FUJIFILM CORPORATION, 富士フイルム株式会社 FILES APPLICATION FOR "VARIABLE POWER OPTICAL SYSTEM, IMAGING DEVICE AND PROJECTION TYPE DISPLAY DEVICE"

GENEVA, April 19 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京&#37117... Read More

INTERNATIONAL PATENT: FUJIKURA LTD., 株式会社フジクラ FILES APPLICATION FOR "MOLDED BODY AND CAPACITANCE SENSOR"

GENEVA, April 19 -- FUJIKURA LTD. (1-5-1, Kiba, Koto-ku, Tokyo1358512), 株式会社フジクラ (東京都江東区木&#2258... Read More

INTERNATIONAL PATENT: THE UNIVERSITY OF OSAKA, 国立大学法人大阪大学 FILES APPLICATION FOR "METHOD FOR DETECTING AIR LEAK PRESENT IN LUMINAL ORGAN AND AGENT FOR DETECTING AIR LEAK"

GENEVA, April 19 -- THE UNIVERSITY OF OSAKA (1-1, Yamadaoka, Suita-shi, Osaka5650871), 国立大学法人大阪大学 (大阪府&#21561... Read More

INTERNATIONAL PATENT: DAI NIPPON PRINTING CO., LTD., 大日本印刷株式会社 FILES APPLICATION FOR "BARRIER FILM, LAMINATE AND PACKAGING BAG"

GENEVA, April 19 -- DAI NIPPON PRINTING CO., LTD. (1-1-1, Ichigaya Kagacho, Shinjuku-ku, Tokyo1628001), 大日本印刷株式会社 (東京&#3711... Read More

INTERNATIONAL PATENT: SHIN-ETSU HANDOTAI CO., LTD., 信越半導体株式会社 FILES APPLICATION FOR "SIGE EPITAXIAL WAFER AND METHOD FOR MANUFACTURING SAME"

GENEVA, April 19 -- SHIN-ETSU HANDOTAI CO., LTD. (2-1, Ohtemachi 2-chome, Chiyoda-ku, Tokyo1000004), 信越半導体株式会社 (東京都&... Read More

INTERNATIONAL PATENT: MITSUBISHI GAS CHEMICAL COMPANY, INC., 三菱瓦斯化学株式会社 FILES APPLICATION FOR "EPOXY RESIN COMPOSITION APPLIED TO MATERIAL TO BE COATED AND USED, USE THEREOF, CURED PRODUCT AND ARTICLE HAVING CURED PRODUCT"

GENEVA, April 19 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (&#26481... Read More

INTERNATIONAL PATENT: SUMITOMO METAL MINING CO., LTD., 住友金属鉱山株式会社 FILES APPLICATION FOR "SEALANT COMPOSITION FOR PROTECTIVE FILM LAYER AND PROTECTIVE FILM FOR ELECTRONIC COMPONENT"

GENEVA, April 19 -- SUMITOMO METAL MINING CO., LTD. (11-3, Shimbashi 5-chome, Minato-ku, Tokyo1058716), 住友金属鉱山株式会社 (東&#2014... Read More

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