INTERNATIONAL PATENT: SHANGHAI H-RAY S & T CO., LTD, 上海氢锐科技有限公司 FILES APPLICATION FOR "ANODE SLURRY, PREPARATION METHOD THEREFOR AND USE THEREOF"

GENEVA, April 4 -- SHANGHAI H-RAY S & T CO., LTD (Room 601, Building 1, No.855, Duhui Road, Zhuanqiao TownMinhang District, Shanghai 201109), 上海氢锐科技有限公司 (中国上海市闵行区颛桥镇都会路855号1号楼六楼601室) filed a patent application (PCT/CN2024/128984) for "ANODE SLURRY, PREPARATION METHOD THEREFOR, AND USE THEREOF" on Oct 31, 2024. With publication no. WO/2026/065648, the details related to the patent application was published on Apr 02, 2026.

Notably, the patent application was submitted under the International Patent Classification (IPC) system, which i...