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INTERNATIONAL PATENT: MURATA MANUFACTURING CO., LTD., 株式会社村田製作所 FILES APPLICATION FOR "SOLID ELECTROLYTIC CAPACITOR AND CONNECTION ELEMENT OF SOLID ELECTROLYTIC CAPACITOR"

GENEVA, Aug. 11 -- MURATA MANUFACTURING CO., LTD. (10-1, Higashikotari 1-chome, Nagaokakyo-shi, Kyoto6178555), 株式会社村田製作所 (京&#37117... Read More


INTERNATIONAL PATENT: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD., パナソニックIPマネジメント株式会社 FILES APPLICATION FOR "NEGATIVE ELECTRODE AND BATTERY"

GENEVA, Aug. 11 -- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (22-6, Moto-machi, Kadoma-shi, Osaka5710057), パナソニックIPマネ&#... Read More


INTERNATIONAL PATENT: AESC JAPAN LTD., 株式会社AESCジャパン FILES APPLICATION FOR "BATTERY CELL"

GENEVA, Aug. 11 -- AESC JAPAN LTD. (K-Tower Yokohama, 6-2-12 Minatomirai, Nishi-ku, Yokohama-shi, Kanagawa2200012), 株式会社AESCジャ&#12... Read More


INTERNATIONAL PATENT: SONY GROUP CORPORATION, ソニーグループ株式会社 FILES APPLICATION FOR "INFORMATION PROCESSING DEVICE AND INFORMATION PROCESSING METHOD"

GENEVA, Aug. 11 -- SONY GROUP CORPORATION (1-7-1, Konan, Minato-ku, Tokyo1080075), ソニーグループ株式会社 (東京都&#2... Read More


INTERNATIONAL PATENT: SUMITOMO SEIKA CHEMICALS CO., LTD., 住友精化株式会社 FILES APPLICATION FOR "METHOD FOR PRODUCING SULFUR-CONTAINING CYCLIC SILOXANE"

GENEVA, Aug. 11 -- SUMITOMO SEIKA CHEMICALS CO., LTD. (346-1, Miyanishi, Harima-cho, Kako-gun, Hyogo6750145), 住友精化株式会社 (兵庫県... Read More


INTERNATIONAL PATENT: KDDI CORPORATION, KDDI株式会社 FILES APPLICATION FOR "TERMINAL DEVICE FOR BEAM SELECTION OF WIRELESS COMMUNICATION USING ARTIFICIAL INTELLIGENCE (AI)/MACHINE LEARNING (ML), BASE STATION DEVICE, CONTROL METHOD AND PROGRAM"

GENEVA, Aug. 11 -- KDDI CORPORATION (3-2, Nishi-Shinjuku 2-chome, Shinjuku-ku, Tokyo1638003), KDDI株式会社 (東京都新宿... Read More


INTERNATIONAL PATENT: WACOM CO., LTD., 株式会社ワコム FILES APPLICATION FOR "SENSOR"

GENEVA, Aug. 11 -- WACOM CO., LTD. (2-510-1 Toyonodai, Kazo-shi Saitama3491148), 株式会社ワコム (埼玉県加須市豊&#373... Read More


INTERNATIONAL PATENT: JSR CORPORATION, JSR株式会社 FILES APPLICATION FOR "METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND METHOD FOR PRODUCING NITROGEN-CONTAINING COMPOUND"

GENEVA, Aug. 11 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), JSR株式会社 (東京都港区東... Read More


INTERNATIONAL PATENT: DAICEL CORPORATION, 株式会社ダイセル FILES APPLICATION FOR "ELECTRIC CIRCUIT BREAKER DEVICE"

GENEVA, Aug. 11 -- DAICEL CORPORATION (3-1, Ofuka-cho, Kita-ku, Osaka-shi, Osaka5300011), 株式会社ダイセル (大阪府大阪&#24... Read More


INTERNATIONAL PATENT: AUTONETWORKS TECHNOLOGIES, LTD., 株式会社オートネットワーク技術研究所, SUMITOMO WIRING SYSTEMS, LTD., 住友電装株式会社, SUMITOMO ELECTRIC INDUSTRIES, LTD., 住友電気工業株式会社 FILES APPLICATION FOR "ABNORMALITY ASSESSMENT DEVICE, ABNORMALITY ASSESSMENT METHOD AND ABNORMALITY ASSESSMENT PROGRAM"

GENEVA, Aug. 11 -- AUTONETWORKS TECHNOLOGIES, LTD. (1-14, Nishisuehiro-cho, Yokkaichi-shi, Mie5108503), 株式会社オートネットワー... Read More